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US and International Patents Awarded in Materials Science and Technology:
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United States Patent Number 5,628,824 entitled
"High Growth Rate Homoepitaxial Diamond Film Deposition at
High Temperatures by Microwave Plasma-Assisted Chemical Vapor Deposition,
Yogesh. K. Vohra and Thomas. S. McCauley, Date of Patent: May 13,
1997.
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United States Patent Number 6,183,818 entitled
“Process for Ultra Smooth Diamond Coating on Metals and Uses
Thereof”, Yogesh K. Vohra and Shane A. Catledge, Date of Patent:
February 6, 2001.
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United States Patent No 6,858,078 entitled
"Apparatus and Method for Diamond Production" Inventors:
Dr. Hemley, Dr. Mao, Dr. Yan, and Dr. Vohra. Issued: issued February
22, 2005.
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